 |
|
|
| |
PRS-4000 series |
| |
Introduction
PRS-4000 series products are photoresist strippers with outstanding performance for both positive- and negative-
photoresist stripping. These photoresist strippers are composed of organic solvents with high boiling point and high flash point, which made the
products safer and lower toxicity. PRS-4000 series photoresist strippers are phenol-free and halogen-free products. Copper, nickel, and aluminum patterns may not
be damaged during stripping process using these PRS-4000 series products.
Specification
Pinky, transparency liquid
BP > 160℃
High solubility in water
|
| |
PRS-5050 |
| |
Introduction
PRS-5050 is a photoresist stripper with outstanding performance for both positive- and negative-
photoresist stripping. This photoresist stripper is composed of organic solvents with high boiling point and high flash point, which made the
products safer and lower toxicity. PRS-5050 photoresist stripper is a phenol-free and halogen-free product. Copper, nickel, and aluminum patterns may not
be damaged during stripping process using these PRS-5050 photoresist stripper.
Specification
Colorless to light yellow, transparency liquid
BP > 160℃
High solubility in water
|
| |
PRS-2030 / PRS-2050 |
| |
Introduction
PRS-2030 and PRS-2050 products are photoresist strippers with outstanding performance for both positive- and negative-
photoresist stripping. PRS-2030 and PRS-2050 photoresist strippers are phenol-free and halogen-free products. Copper, nickel, and aluminum patterns may not
be damaged during stripping process using these PRS-2030 and PRS-2050 products.
Specification
Colorless to light yellow, transparency liquid
High solubility in water
|
| |
PV-200 series |
| |
Introduction
PV-200 series products are photoresist strippers for semiconductor industries usage. PV-200 series products have outstanding performance for both positive- and negative-
photoresist stripping. After ICP process treatment, photoresists also can be removed by PV-200 series photoresist strippers easily.
PV-200 series photoresist strippers are phenol-free and halogen-free products. Copper, nickel, and aluminum patterns may not
be damaged during stripping process using these PV-200 series products.
Specification
Colorless to light yellow, transparency liquid
High solubility in water
|
| |
PV-700 series |
| |
Introduction
PV-700 series products are photoresist strippers for semiconductor industries usage. PV-700 series products have outstanding performance for both positive- and negative-
photoresist stripping. After ICP process treatment, photoresists also can be removed by PV-700 series photoresist strippers easily.
PV-700 series photoresist strippers are phenol-free and halogen-free products. Copper, nickel, and aluminum patterns may not
be damaged during stripping process using these PV-700 series products.
Specification
Colorless to light yellow, transparency liquid
High solubility in water
|
| |
PRD-2000 / PRD-2001 |
| |
Introduction
PRD-2000 and PRD-2001 are water-based developer, which can be widely used for both positive- and negative- photoresists developing in semi-conductor production process.
Due to the benene-free composition, high resolution can be obtained using PRD-2000 and PRD-2001 for photoresist develop.
PRD-2000 and PRD-2001 are also sodium- and potassium-free to prevent wafer polluted.
Formula of PRD-2001 has surfactant, which may enhance the performance and high resolution on PR may be acquired.
Specification
Colorless and transparency liquid
High solubility in water
|
| |
PRD-1000 |
| |
Introduction
PRD-1000 and PRD-1001 are water-based developer, which can be widely used for both positive- and negative- photoresists developing in semi-conductor production process.
Due to the benene-free composition, high resolution can be obtained using PRD-1000 and PRD-1001 for photoresist develop.
Formula of PRD-1001 has surfactant, which may enhance the performance and high resolution on PR may be acquired.
Specification
Colorless and transparency liquid
High solubility in water
|
| |
MTET-A85 / -A95 / -A99 |
| |
Introduction
MTET-A85 / -A95 / -A99 are formulated solvents, which can be applied for semiconductor ethcing process.
MTET-A85 / -A95 / -A99 can be used for copper, nickle, aluminum, and gallium arsenide etching.
For various metal layers and etching-stop layers, designated product can be selected to acquire the best etching performance.
Specification
Colorless and transparency liquid
High solubility in water
|
| |
MTET-K |
| |
Introduction
MTET-K is a formulated solvent, which can be applied for gold ethcing process on semiconductor or printed circuit board industries.
For various gold layers, ex., electro-plated, electroless plated, or evaporation plated, MTET-K applied may acquire the best etching performance.
Specification
Dark blue liquid
High solubility in water
|
| |
MTET-Cr20 |
| |
Introduction
MTET-Cr20 is a formulated solvent, which can be applied for chrominum ethcing process on semiconductor industry.
For chrominum removal or chrominum etching process, MTET-Cr20 applied may acquire the best performance.
Specification
Orange and transparency liquid
High solubility in water
|
| Metal Surface Treatment Agent |
| |
DE-900 series |
| |
Introduction
DE-900 series products are formulated solvent, which can be applied for epoxy remove in semiconductor or other industries application.
DE-900 series products are phenol-free and halogen-free product. For both thermal-cured or UV-cured epoxy,
these safe and lower toxicity products applied may acquire the best performance.
Specification
High solubility in water
|
| |
MTA-CA100 |
| |
Introduction
MTA-CA100 is a formulated solvent, which can be applied for metal protection in semiconductor or other industries application.
MTA-CA100 is a phenol-free and halogen-free product. For anti-oxidant of copper of anti-tarnish of silver,
this safe and lower toxicity product applied may acquire the best performance.
Specification
Colorless and transparency liquid
High solubility in water
|
| |
MTA-S4 |
| |
Introduction
MTA-S4 is a formulated solvent, which can be applied for photomask cleaning in semiconductor or other industries application.
MTA-S4 is a phenol-free and halogen-free product. For quartz or glass photomask with Chromium coated,
this safe and lower toxicity product applied may acquire the best performance.
Specification
High solubility in water
|
| |
| Introduction
For novel production process or special usage, we provide customized products, e.g. chemical or fixture design, to our coustomers. You may contact
and provide your needed to our sales / RD team.
|
|
|
|
 |
 |
地址: 324桃園市平鎮區復旦路4段135巷11號
No. 11, Lane 135, Sec. 4, Fudan Rd., Pingchen, Taoyuan, Taiwan 324, ROC
TEL: 03-4953517 FAX: 03-4953518
E-mail: solution.chemicals@gmail.com |
|
